DocumentCode :
870346
Title :
An analytical open-failure lifetime model for stress-induced voiding in aluminum lines
Author :
Okabayashi, Hidekazu
Author_Institution :
NEC Corp., Ibaraki, Japan
Volume :
40
Issue :
4
fYear :
1993
fDate :
4/1/1993 12:00:00 AM
Firstpage :
782
Lastpage :
788
Abstract :
An analytical model is derived for determining the time before which LSI aluminum (Al) lines with a bamboo-grain structure undergo open failures caused by stress-induced voiding. Derivations are based on the following assumptions: that the driving force for void growth is relaxation of Al-line tensile stress, that the mass transport rate is proportional to the nth power of Al-line stress, and that the void will maintain its prism shape throughout its growth. The critical minimum initial tensile stress value for producing open failure is calculated, as are the respective dependencies of lifetime on void tip angle, temperature, line dimensions, and line tensile stress. By adjusting the values of certain parameters within the model, it is possible to derive temperature, line-dimension, and tensile-stress dependencies that fall within the range of experimentally obtained results
Keywords :
aluminium; large scale integration; metallisation; reliability; Al metallisation; analytical model; bamboo-grain structure; critical minimum initial tensile stress; dependencies of lifetime; driving force for void growth; line dimensions; line tensile stress; mass transport rate; open failures; open-failure lifetime model; prism shape; stress-induced voiding; temperature; tensile stress relaxation; void tip angle; Aluminum; Analytical models; Artificial intelligence; Creep; Numerical models; Predictive models; Shape; Temperature dependence; Temperature distribution; Tensile stress;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.202791
Filename :
202791
Link To Document :
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