DocumentCode
870890
Title
An online test microstructure for thermal conductivity of surface-micromachined polysilicon thin films
Author
Xu, Gao-Bin ; Huang, Qing-An
Author_Institution
Key Lab. of MEMS, Southeast Univ., Nanjing, China
Volume
6
Issue
2
fYear
2006
fDate
4/1/2006 12:00:00 AM
Firstpage
428
Lastpage
433
Abstract
An online test structure for measuring the thermal conductivity of surface micromachined polysilicon thin films is presented. In the structure, a pair of microstructures, i.e., a reference structure and a test structure, are used. The surface micromachined structures are heated electrically. Heat dissipation by convection, radiation, and heat transfer through the air gap and into the substrate is considered in an electrothermal model. The model is confirmed by ANSYS Software. In experiments, current-voltage measurements are only required, and all measurements can be carried out in free air. The surface-micromachined and p-doped polysilicon thin films with a sheet resistance 116.25 Ω/sq. are measured to have a thermal conductivity 28.7 W/mK at 300 K.
Keywords
micromachining; micromechanical devices; silicon; thermal conductivity measurement; thin films; 300 K; electric heating; electrothermal model; heat dissipation; online test microstructure; p-doped polysilicon thin films; surface micromachining; thermal conductivity measurement; Conductivity measurement; Current measurement; Electrical resistance measurement; Heat transfer; Microstructure; Resistance heating; Surface resistance; Testing; Thermal conductivity; Transistors; Online test; polysilicon thin films; surface-micromachining process; thermal conductivity;
fLanguage
English
Journal_Title
Sensors Journal, IEEE
Publisher
ieee
ISSN
1530-437X
Type
jour
DOI
10.1109/JSEN.2006.870169
Filename
1608086
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