• DocumentCode
    871993
  • Title

    Charge Collection Measurements for Heavy Ions Incident on n- and p-Type Silicon

  • Author

    Oldham, T.R. ; McLean, F.B.

  • Author_Institution
    U.S. Army ERADCOM/Harry Diamond Laboratories Adelphi, Maryland 20783
  • Volume
    30
  • Issue
    6
  • fYear
    1983
  • Firstpage
    4493
  • Lastpage
    4500
  • Abstract
    We present the results of charge collection measurements for heavy ions incident on n- and p-type silicon for a range of doping densities and bias conditions. The total collected charge agrees reasonably well for most particles with the simple model we presented last year. However, the model begins to break down for very highly ionizing particles. The experiments also indicate that the collection time increases with ionization density, so that significant recovery of the struck junction may occur during the collection process. We also found that recombination is only a small effect; and the charge collection does not seem to depend strongly on angle of incidence, at least for the cases where we performed measurements. We discuss the implications of all these findings for circuits operating in a cosmic ray environment.
  • Keywords
    Alpha particles; Charge measurement; Circuits; Current measurement; Doping; Ionization; Performance evaluation; Plasma density; Semiconductor process modeling; Silicon;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1983.4333160
  • Filename
    4333160