DocumentCode
873545
Title
Analytical drain thermal noise current model valid for deep submicron MOSFETs
Author
Han, Kwangseok ; Shin, Hyungcheol ; Lee, Kwyro
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., Korea Adv. Inst. of Sci. & Technol., Daejeon, South Korea
Volume
51
Issue
2
fYear
2004
Firstpage
261
Lastpage
269
Abstract
In this paper, a physics-based MOSFET drain thermal noise current model valid for deep submicron channel lengths was derived and verified with experiments. It is found that the well-known μQinv/L2 formula, previously derived for long channels, remains valid for short channels. Carrier heating in the gradual channel region was taken into account implicitly with the form of diffusion noise source and then impedance field method taking velocity saturation effect was used to calculate the external drain thermal noise current. The derived model was verified by experimental noise for devices with channel lengths down to 0.18 μm. Excellent agreement between measured and modeled drain thermal noise was obtained for the entire VGS and VDS bias regions.
Keywords
MOSFET; current-mode logic; impedance matching; nanotechnology; semiconductor thin films; thermal noise; thermal properties; 0.18 μm channel lengths; analytical drain thermal noise current model; bias regions; carrier heating; deep submicron MOSFET; deep submicron channel lengths; diffusion noise source; gradual channel region; impedance field method; long channels; physics-based model; short channels; velocity saturation effect; Circuit noise; Circuit optimization; Electrons; Heating; Impedance; MOSFETs; Noise generators; Noise measurement; Radio frequency; Semiconductor device modeling;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2003.821708
Filename
1262656
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