• DocumentCode
    875795
  • Title

    A highly efficient adaptive mesh approach to semiconductor device simulation-application to impact ionization analysis

  • Author

    Dang, Ryo ; Matsushita, Kenchi ; Hayashi, Hirokazu

  • Author_Institution
    Coll. of Eng., Hosei Univ., Tokyo, Japan
  • Volume
    27
  • Issue
    5
  • fYear
    1991
  • fDate
    9/1/1991 12:00:00 AM
  • Firstpage
    4162
  • Lastpage
    4165
  • Abstract
    In the simulation of semiconductor devices, it is desirable to obtain accurate results at low calculation costs. Both conditions are, however, difficult to satisfy simultaneously since high accuracy always calls for a high computation cost. This is mainly due to the need for a large mesh number for the numerical solution of governing equations. Since the adaptive mesh method is known to be effective in dealing with a tradeoff problem of this kind, the authors propose an efficient adaptive mesh-generation algorithm based on an evaluation of impact ionization discretization errors. It is found that the approach reduces computation cost at no expense in accuracy.
  • Keywords
    circuit analysis computing; impact ionisation; semiconductor devices; accuracy; adaptive mesh method; adaptive mesh-generation algorithm; computation cost; control volume method; discretization errors; finite difference method; impact ionization analysis; semiconductor device simulation; Analytical models; Charge carrier processes; Computational efficiency; Computational modeling; Current density; Impact ionization; Mesh generation; Poisson equations; Semiconductor devices; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.105018
  • Filename
    105018