DocumentCode
875799
Title
A new cell structure for very thin high-efficiency silicon solar cells
Author
Uematsu, Tsuyoshi ; Ida, Minoru ; Hane, Kunio ; Kokunai, Shigeru ; Saitoh, Tadashi
Author_Institution
Hitachi Ltd., Tokyo, Japan
Volume
37
Issue
2
fYear
1990
fDate
2/1/1990 12:00:00 AM
Firstpage
344
Lastpage
347
Abstract
The cell has a corrugated structure, which is formed by aligned V grooves on both the front and back surfaces. The substrate thickness is reduced to 50 μm while retaining high mechanical strength. This permits ease of handling during the fabrication process and subsequent procedures. This thin substrate promises a very high open-circuit voltage, and the structure is also beneficial to high optical performance. The surface reflectance is reduced in the same manner as that of V-grooved cells, but the optical path is lengthened by a minimum of four times the substrate thickness. Performance of experimental cells is also discussed
Keywords
elemental semiconductors; silicon; solar cells; Si; aligned V grooves; cell structure; corrugated structure; ease of handling; experimental cells; high efficiency solar cells; high mechanical strength; high open-circuit voltage; high optical performance; optical path; semiconductors; substrate thickness; surface reflectance; thin substrate; Charge carrier lifetime; Corrugated surfaces; Etching; Laboratories; Optical device fabrication; Photovoltaic cells; Reflectivity; Silicon; Stress; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.46363
Filename
46363
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