DocumentCode :
881697
Title :
Formation of optical slab waveguides using thermal oxidation of SiOx
Author :
Lai, Q. ; Pliska, P. ; Schmid, J. ; Hunziker, W. ; Melchior, H.
Author_Institution :
Swiss Federal Inst. of Technol., Zurich, Switzerland
Volume :
29
Issue :
8
fYear :
1993
fDate :
4/15/1993 12:00:00 AM
Firstpage :
714
Lastpage :
716
Abstract :
A novel method for the fabrication of optical slab waveguides is presented. After growth of the base cladding by thermal oxidation and deposition of the core layer of the waveguide by PECVD of SiOx, the top cladding layer is formed from the core layer material by an additional thermal oxidation which transforms SiOx into SiO2. With this simple technology, contaminations and rough interfaces between core and cladding are avoided. Low propagation losses and good matching to optical fibres are achieved.
Keywords :
optical losses; optical waveguides; optical workshop techniques; oxidation; silicon compounds; PECVD; Si; Si-SiO 2-SiO x; SiO 2; cladding layer; core layer material; fabrication; optical slab waveguides; propagation losses; silica waveguides; thermal oxidation;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19930478
Filename :
209971
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=881697
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