Physical characterization of hot-electron-induced MOSFET degradation through an improved approach to the charge-pumping technique

The physical mechanisms which are involved in the hot-carrier-induced degradation of CMOS transistor are analyzed by means of an improved approach to the charge-pumping measurement technique. The proposed experimental procedure allows the simultaneous characterization of both interface-states generation and carrier trapping in the gate insulator. The analysis is extended to both static and dynamic degradation processes, whose differences and similarities are discussed