• DocumentCode
    882012
  • Title

    Field dependence of ionisation rates of electrons in silicon

  • Author

    Ahmad, Sahar

  • Volume
    5
  • Issue
    21
  • fYear
    1969
  • Firstpage
    536
  • Lastpage
    537
  • Abstract
    A theoretical model for the ionisation coefficient of electrons in silicon has been developed based on the solution of the Boltzmann transport equation. Analytic expressions are obtained for the ionisation coefficient and the drift velocity. Modifications in the deformation potential constants have been suggested for obtaining a fit to the experimentally observed results for the drift velocity and ionisation coefficient. The mean free path for ionisation calculated with the help of this model fits well with the earlier predictions.
  • Keywords
    electron ionisation; elemental semiconductors; high field effects; semiconductor materials; silicon;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19690402
  • Filename
    4210621