DocumentCode :
882469
Title :
Charge capacity analysis of the charge-coupled RAM cell
Author :
Tasch, A.F. ; Holloway ; Frye, R.C.
Volume :
11
Issue :
5
fYear :
1976
Firstpage :
575
Lastpage :
585
Abstract :
The charge (or storage) capacity of the dynamic charge-coupled (CC) random access memory (RAM) cell is analyzed. Theoretical expressions for the capacity are developed which provide excellent agreement between theory and experiment. Test devices were operated with typical dynamic metal-oxide-semiconductor (MOS) RAM voltages, and exhibited charge capacities (per unit area) up to 52 and 86 percent of that of the conventional one-transistor cell for substrate bias voltages of -5 and -1 V, respectively. A simplified model of the CC RAM cell is used to illustrate the dependence of the charge capacity on the device and operating parameters. This model is useful for defining the limitations on capacity and for comparing the capacities of the CC and the one-transistor cells for a variety of conditions. In general, the CC RAM cell charge capacity per unit area ranges from 50 to over 100 percent of that of the one-transistor cell for conventional device parameters. A somewhat higher range applies for projection to low-voltage and very high-density RAM´s.
Keywords :
Charge-coupled devices; Digital integrated circuits; Monolithic integrated circuits; Random-access storage; Semiconductor device models; Semiconductor storage devices; charge-coupled devices; digital integrated circuits; monolithic integrated circuits; random-access storage; semiconductor device models; semiconductor storage devices; Detectors; Genetic expression; Implants; Leakage current; Power dissipation; Random access memory; Read-write memory; Research and development; Testing; Voltage;
fLanguage :
English
Journal_Title :
Solid-State Circuits, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9200
Type :
jour
DOI :
10.1109/JSSC.1976.1050784
Filename :
1050784
Link To Document :
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