DocumentCode :
886431
Title :
Correlation between CMOS Transistor and Capacitor Measurements of Interface Trap Spectra
Author :
Russell, T.J. ; Bennett, H.S. ; Gaitan, M. ; Suehle, J.S. ; Roitman, P.
Volume :
33
Issue :
6
fYear :
1986
Firstpage :
1228
Lastpage :
1233
Abstract :
The radiation-induced change in the energy spectra of SiO2-Si interface traps as determined using the charge-pumping and weak-inversion techniques on CMOS transistors and using the quasi-static C-V and detailed model techniques on CMOS capacitors are compared. Over the range of approximately 1010 to 1012 cm-1 eV-1, good quantitative agreement is obtained between these methods.
Keywords :
CMOS technology; Charge pumps; Current measurement; Electron traps; Integrated circuit modeling; MOS capacitors; MOSFETs; Semiconductor device modeling; Semiconductor process modeling; Threshold voltage;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1986.4334583
Filename :
4334583
Link To Document :
بازگشت