DocumentCode
886552
Title
Measurement of excess loss in planar silica X junctions
Author
Mackenzie, F. ; Beaumont, C.J. ; Nield, M. ; Cassidy, S.A.
Author_Institution
BT Labs., Ipswich, UK
Volume
28
Issue
20
fYear
1992
Firstpage
1919
Lastpage
1920
Abstract
Planar silica provides a compact and stable medium for the fabrication of optical delay lines for signal processing applications. One particularly compact design involves the use of 90 degrees crossovers (X junctions) to allow coiling of buried channel waveguides to form the delay line without the discontinuity loss associated with loopback structures. The authors present measurements of the excess loss due to these and compare the results with theoretical treatment.
Keywords
delay lines; optical losses; optical waveguide components; optical waveguide theory; silicon compounds; 90 degrees crossovers; SiO 2; buried channel waveguides; excess loss; planar silica X junctions;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19921228
Filename
161254
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