• DocumentCode
    886552
  • Title

    Measurement of excess loss in planar silica X junctions

  • Author

    Mackenzie, F. ; Beaumont, C.J. ; Nield, M. ; Cassidy, S.A.

  • Author_Institution
    BT Labs., Ipswich, UK
  • Volume
    28
  • Issue
    20
  • fYear
    1992
  • Firstpage
    1919
  • Lastpage
    1920
  • Abstract
    Planar silica provides a compact and stable medium for the fabrication of optical delay lines for signal processing applications. One particularly compact design involves the use of 90 degrees crossovers (X junctions) to allow coiling of buried channel waveguides to form the delay line without the discontinuity loss associated with loopback structures. The authors present measurements of the excess loss due to these and compare the results with theoretical treatment.
  • Keywords
    delay lines; optical losses; optical waveguide components; optical waveguide theory; silicon compounds; 90 degrees crossovers; SiO 2; buried channel waveguides; excess loss; planar silica X junctions;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19921228
  • Filename
    161254