DocumentCode
886935
Title
Factors Contributing to Cmos Static Ram Upset
Author
Ackermann, M.R. ; Mikawa, R.E. ; Massengill, L.W. ; Diehl, S.E.
Author_Institution
Sandia National Laboratories Albuquerque, NM 87185
Volume
33
Issue
6
fYear
1986
Firstpage
1524
Lastpage
1529
Abstract
Phenomena contributing to transient radiation induced static RAM (SRAM) cell upset in CMOS integrated circuits (ICs) include rail span collapse, dynamic FET threshold voltage shifts, photocurrents internal to the RAM cell, secondary photocurrents, and lateral variations in silicon surface potential. Of these phenomena, it is found that the major contributors are rail span collapse and internal cell photocurrents. A model is presented which combines global rail span collapse calculations with detailed analyses of local effects in the ram cell.
Keywords
Circuit simulation; Integrated circuit modeling; P-n junctions; Photoconductivity; Predictive models; Rails; Random access memory; Read-write memory; Semiconductor device modeling; Threshold voltage;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1986.4334635
Filename
4334635
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