• DocumentCode
    886935
  • Title

    Factors Contributing to Cmos Static Ram Upset

  • Author

    Ackermann, M.R. ; Mikawa, R.E. ; Massengill, L.W. ; Diehl, S.E.

  • Author_Institution
    Sandia National Laboratories Albuquerque, NM 87185
  • Volume
    33
  • Issue
    6
  • fYear
    1986
  • Firstpage
    1524
  • Lastpage
    1529
  • Abstract
    Phenomena contributing to transient radiation induced static RAM (SRAM) cell upset in CMOS integrated circuits (ICs) include rail span collapse, dynamic FET threshold voltage shifts, photocurrents internal to the RAM cell, secondary photocurrents, and lateral variations in silicon surface potential. Of these phenomena, it is found that the major contributors are rail span collapse and internal cell photocurrents. A model is presented which combines global rail span collapse calculations with detailed analyses of local effects in the ram cell.
  • Keywords
    Circuit simulation; Integrated circuit modeling; P-n junctions; Photoconductivity; Predictive models; Rails; Random access memory; Read-write memory; Semiconductor device modeling; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1986.4334635
  • Filename
    4334635