Title :
Noncontact critical dimension metrology sensor for chrome photomasks featuring a low-temperature co-fired ceramic technology
Author :
Guillaume, Nadine M P ; Allen, Richard A. ; Cresswell, Michael W. ; Lahti, Markku ; Linholm, Loren W. ; Zaghloul, Mona E.
Author_Institution :
VTT Inf. Technol., Finland
Abstract :
This paper describes a noncontact capacitive-sensor metrology sensor developed to measure minimum feature sizes, also called critical dimensions, patterned on photomasks that are used in semiconductor device manufacture. Additionally, this paper describes the test structures printed on photomasks that facilitate linewidth metrology with the new sensor. The metrology sensor is fabricated using a low temperature co-fired ceramic technology and its principle is based on noncontact microcapacitance measurements of features on chrome-on-glass reticles.
Keywords :
capacitive sensors; ceramics; reticles; semiconductor device manufacture; spatial variables measurement; chrome photomasks; chrome-on-glass reticles; critical dimensions; linewidth metrology; low-temperature co-fired ceramic technology; minimum feature sizes; noncontact capacitive-sensor metrology sensor; noncontact critical dimension metrology sensor; noncontact microcapacitance measurements; semiconductor device manufacture; test structures; Atomic force microscopy; Capacitive sensors; Ceramics; Costs; Lithography; Metrology; Optical microscopy; Optical sensors; Scanning electron microscopy; Temperature sensors;
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
DOI :
10.1109/TSM.2003.822736