DocumentCode :
888729
Title :
MOS voltage reference based on polysilicon gate work function difference
Author :
Oguey, Henri J. ; Gerber, Bernard
Volume :
15
Issue :
3
fYear :
1980
fDate :
6/1/1980 12:00:00 AM
Firstpage :
264
Lastpage :
269
Abstract :
A voltage reference in CMOS technology is based upon transistor pairs of the same type except for the opposite doping type of their polysilicon gates. At identical drain currents, the gate voltage difference, close to the silicon bandgap, is 1.2 V/spl plusmn/0.06 V. Circuits for a positive and for a negative voltage reference are presented. Digital voltage tuning improves accuracy. Temperature compensation is provided by proper choice of current ratio or by means of an auxiliary circuit. Voltage drift is about 300 ppm//spl deg/C without compensation, and can be reduced to /spl plusmn/30 ppm//spl deg/C. The circuits work with a supply voltage of 2-10 V and draw a current that is less than 1 /spl mu/A.
Keywords :
Field effect integrated circuits; Reference circuits; field effect integrated circuits; reference circuits; CMOS technology; Circuit optimization; Conductivity; Doping; Integrated circuit technology; MOSFETs; Photonic band gap; Silicon; Temperature dependence; Voltage;
fLanguage :
English
Journal_Title :
Solid-State Circuits, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9200
Type :
jour
DOI :
10.1109/JSSC.1980.1051381
Filename :
1051381
Link To Document :
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