A CMOS Image Sensor Utilizing Opacity of Nanometallic Particles for DNA Detection

Author

Wang, Yijin ; Xu, Chen ; Li, Jiong ; He, Jin ; Chan, Mansun

Author_Institution

Hong Kong Univ. of Sci. & Technol.

Volume

54

Issue

6

fYear

2007

fDate

6/1/2007 12:00:00 AM

Firstpage

1549

Lastpage

1554

Abstract

This paper reports a DNA detection protocol utilizing the opacity of self-assembled nanometallic particles and the optical response of a CMOS image sensor. Due to the complementary nature of the DNA hybridization process, the DNA fragments attached to the nanoparticles precipitate them only at locations where complementary DNA strands exist. The opacity of the chip surface change due to the accumulation of nanometallic particles can be used to detect the existence of some targeted DNA fragments. Ordinary light sources can be used in this approach rather than special ultraviolet light sources in the most popular fluorescence-based detection method. DNA detection has been carried out on a CMOS image sensor chip fabricated using a standard 0.5-mum CMOS process. It has been demonstrated that the approach is very sensitive, detecting even single-base mismatched DNA targets with extremely low concentration DNA samples down to 10 pM

Keywords

CMOS image sensors; DNA; light sources; molecular biophysics; nanoparticles; opacity; 0.5 micron; CMOS image sensor; CMOS process; DNA detection; DNA hybridization process; optical response; ordinary light sources; self-assembled nanometallic particles; surface opacity; Biomedical optical imaging; CMOS image sensors; CMOS technology; DNA; Fluorescence; Helium; Light sources; Nanoparticles; Optical sensors; Protocols; CMOS image sensor-based DNA detection; fully CMOS compatible; high selectivity; high sensitivity;

fLanguage

English

Journal_Title

Electron Devices, IEEE Transactions on

Publisher

ieee

ISSN

0018-9383

Type

jour

DOI

10.1109/TED.2007.896388

Filename

4215202