• DocumentCode
    892932
  • Title

    A 256K ROM fabricated using n-well CMOS process technology

  • Author

    Kamuro, Setsufumi ; Masaki, Yoshifumi ; Sano, Kenji ; Kimura, Seiji

  • Volume
    17
  • Issue
    4
  • fYear
    1982
  • Firstpage
    723
  • Lastpage
    726
  • Abstract
    A 256K bit CMOS ROM with a speed-power product of 0.085 pJ/bit has been developed. The excellent speed-power product and the high packing density have been achieved by using n-well CMOS technology and a serial-parallel ROM cell structure. The concept and characteristics of a serial-parallel ROM cell structure are discussed and compared to conventional ROM cell structures. The serial-parallel ROM cell structure gives more flexibility for ROM matrix design. The chip size and memory cell size of the 256K CMOS ROM are 5.98/spl times/6.00 mm and 7.0/spl times/7.0 /spl mu/m, respectively. Access time is 370 ns. The power supply currents in active and quiescent modes are 12 mA and less than 0.1 /spl mu/A at +5 V, respectively.
  • Keywords
    Field effect integrated circuits; Integrated circuit technology; Integrated memory circuits; Read-only storage; field effect integrated circuits; integrated circuit technology; integrated memory circuits; read-only storage; Boron; CMOS process; CMOS technology; Current supplies; Microprocessors; Natural languages; Power supplies; Read only memory; Synthesizers; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Solid-State Circuits, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9200
  • Type

    jour

  • DOI
    10.1109/JSSC.1982.1051802
  • Filename
    1051802