DocumentCode
893368
Title
Wide passband wavelength multi/demultiplexer at 1.3/1.55 μm based on etched Fresnel mirror μ
Author
Aarnio, J. ; Heimala, P. ; Stuns, I.
Author_Institution
VTT, Tech. Res. Centre of Finland, Semicond. Lab., Espoo, Finland
Volume
139
Issue
3
fYear
1992
fDate
6/1/1992 12:00:00 AM
Firstpage
228
Lastpage
236
Abstract
The design, fabrication and analysis of the performance of an integrated optical wide passband multi/demultiplexer at 1.3 μm and 1.55 μm are presented. The device uses a large angle of incidence totally reflecting Fresnel mirror with average grating period of 44 μm to separate the wavelengths. The multi/demultiplexer is fabricated both on quartz and on silicon substrates using silica-based waveguide technology. The 3-dB passbands exceed 60 nm with crosstalk below -20 dB
Keywords
diffraction gratings; etching; frequency division multiplexing; integrated optics; mirrors; multiplexing equipment; optical waveguides; optical workshop techniques; 1.3 micron; 1.55 micron; IR; Si substrates; SiO2; average grating period; etched Fresnel mirror; integrated optical wide passband multi/demultiplexer; large angle of incidence; multiplexer design; multiplexer fabrication; quartz; silica-based waveguide technology; totally reflecting Fresnel mirror; wavelength multi/demultiplexer; wavelength separation;
fLanguage
English
Journal_Title
Optoelectronics, IEE Proceedings J
Publisher
iet
ISSN
0267-3932
Type
jour
Filename
144795
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