• DocumentCode
    896283
  • Title

    Mechanisms for hot-carrier-induced degradation in reoxidized-nitrided-oxide n-MOSFET´s under combined AC/DC stressing

  • Author

    Ma, Zhi-Jian ; Lai, P.T. ; Liu, Zhi Hong ; Ko, Ping K. ; Cheng, Yiu Chung

  • Author_Institution
    Dept. of Electron. Eng., Hong Kong Univ., Hong Kong
  • Volume
    40
  • Issue
    6
  • fYear
    1993
  • fDate
    6/1/1993 12:00:00 AM
  • Firstpage
    1112
  • Lastpage
    1120
  • Abstract
    Hot-carrier-induced degradation behavior of reoxidized-nitrided-oxide (RNO) n-MOSFETs under combined AC/DC stressing was extensively studied and compared with conventional-oxide (OX) MOSFETs. A degradation mechanism is proposed in which trapped holes in stressed gate oxide are neutralized by an ensuing hot-electron injection, leaving lots of neutral electron traps in the gate oxide, with no significant generation of interface states. The degradation behavior of threshold voltage, subthreshold gate-voltage swing, and charge-pumping current during a series of AC/DC stressing supports this proposed mechanism. RNO device degradation during AC stressing arises mainly from the charge trapping in gate oxide rather than the generation of interface states due to the hardening of the Si-SiO2 interface by nitridation/reoxidation steps
  • Keywords
    electron traps; electron-hole recombination; hole traps; hot carriers; insulated gate field effect transistors; interface electron states; nitridation; oxidation; semiconductor device testing; RNO device degradation; Si-SiO2 interface; charge-pumping current; combined AC/DC stressing; hot-carrier-induced degradation; hot-electron injection; interface states; nMOSFET; neutral electron traps; reoxidized-nitrided-oxide; stressed gate oxide; subthreshold gate-voltage swing; threshold voltage; trapped holes; Charge carrier processes; Computer science; Degradation; Electron traps; Hot carriers; Interface states; MOS devices; MOSFET circuits; Stress; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.214737
  • Filename
    214737