DocumentCode
897984
Title
Improvement in radiation hardness of reoxidized nitrided oxide (RNO) in the absence of post-oxidation anneal
Author
Wu, You-Lin ; Hwu, Jenn-Gwo
Author_Institution
Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
Volume
14
Issue
1
fYear
1993
Firstpage
1
Lastpage
3
Abstract
A simple radiation-hard process for rapid thermal reoxidized nitrided oxide (RNO) structures is proposed. This process involves fast pulling (FP) of samples out of the furnace in a mixture of oxygen and nitrogen immediately after the oxidation has been completed. Samples with starting oxides prepared by conventional postoxidation annealing (POA) are also compared. It is found from CV curves that the initial interface property of an RNO structure with a fast pulled starting oxide (RNO/sub FP/) is almost the same as that with a postoxidation annealed starting oxide (RNO/sub POA/); however, after being exposed to Co-60 irradiation, the former becomes superior to the latter. Excess oxygen left at interface in the starting oxide during the fast pulling procedure might be the origin of the radiation-hard property for RNO/sub FP/ structures.<>
Keywords
gamma-ray effects; nitridation; oxidation; radiation hardening (electronics); rapid thermal processing; /sup 60/Co radiation; CV curves; Co-60 irradiation; RNO; fast pulled starting oxide; fast pulling; gamma radiation; initial interface property; oxidation; postoxidation annealing; radiation hardness; radiation-hard process; rapid thermal reoxidized nitrided oxide; reoxidized nitrided oxide; Aluminum; Degradation; Furnaces; MOS capacitors; Nitrogen; Oxidation; Rapid thermal annealing; Rapid thermal processing; Semiconductor devices; Temperature;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/55.215081
Filename
215081
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