DocumentCode
898222
Title
Extension of impact-ionization multiplication coefficient measurements to high electric fields in advanced Si BJT´s
Author
Zanoni, Enrico ; Crabbé, Emmanuel F. ; Stork, Johannes M C ; Pavan, Paolo ; Verzellesi, Giovanni ; Vendrame, Loris ; Canali, Claudio
Author_Institution
Dipartimento di Elettronica ed Inf., Padova Univ., Italy
Volume
14
Issue
2
fYear
1993
Firstpage
69
Lastpage
71
Abstract
Measurements of the impact-ionization multiplication coefficient M-1 in advanced Si BJTs up to values in excess of 10 (corresponding to a peak electric field at the base-collector junction of about 9*10/sup 5/ V/cm) are presented. The intrinsic limitations affecting M-1 measurements at high electric fields are discussed. In particular, the fundamental role played by the negative base current and the parasitic base resistance in determining instabilities during M-1 measurements is pointed out. An accurate theoretical prediction of the M-1 coefficient on collector-base voltages close to BV/sub CBO/ requires that the contribution of holes to impact ionization be properly accounted for.<>
Keywords
bipolar transistors; high field effects; impact ionisation; Si devices; advanced BJT; elemental semiconductor; high electric fields; impact-ionization multiplication coefficient; instabilities; negative base current; parasitic base resistance; Associate members; Current density; Current measurement; Electric resistance; Electric variables measurement; Electrical resistance measurement; Impact ionization; Irrigation; Senior members; Voltage;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/55.215111
Filename
215111
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