DocumentCode
898237
Title
Large-capacity semiconductor memory
Author
Hodges, David A.
Author_Institution
Bell Telephone Laboratories, Inc., Murray Hill, N. J.
Volume
56
Issue
7
fYear
1968
fDate
7/1/1968 12:00:00 AM
Firstpage
1148
Lastpage
1162
Abstract
Integrated-circuit memories using bipolar transistor technology are compared with memories based on various forms of the insulated-gate field-effect transistor (IGFET). A combination of p-channel IGFET memory cells with bipolar transistor access circuits appears to offer a desirable combination of characteristics. Memory organization, chip design, packaging, and interconnection alternatives are considered. Beam-lead sealed-junction technology has significant advantages over other packaging and interconnection technologies in the realization of semiconductor memory. Some of the problems expected in the design of a million-bit computer memory are examined with attention to power dissipation, interconnections, reliability, maintainability, and cost. Finally, the potential characteristics of a million-bit semiconductor memory based on today´s technology are compared with the characteristics of ferrite core, planar film, and cylindrical film magnetic memories. The conclusion drawn from this exploratory study is that semiconductor memory has attractive potential for both small- and large-capacity memory applications.
Keywords
FETs; Ferrite films; Insulated gate bipolar transistors; Insulation; Integrated circuit interconnections; Integrated circuit technology; Magnetic films; Semiconductor device packaging; Semiconductor films; Semiconductor memory;
fLanguage
English
Journal_Title
Proceedings of the IEEE
Publisher
ieee
ISSN
0018-9219
Type
jour
DOI
10.1109/PROC.1968.6512
Filename
1448442
Link To Document