Silicon-based polarization optics for the 1.30 and 1.55 μm communication wavelengths

Author

Azzam, R.M.A. ; Howlader, M.M.K.

Author_Institution

Dept. of Electr. Eng., New Orleans Univ., LA, USA

Volume

14

Issue

5

fYear

1996

fDate

5/1/1996 12:00:00 AM

Firstpage

873

Lastpage

878

Abstract

A modular three-reflection prism of Si can be designed to function as an in-line (nondeviating) linear polarizer or quarterwave retarder at the 1.30 and 1.55 μm lightwave communication wavelengths. Si-related thin films are employed as optical coatings. In particular, a single-layer antireflection coating of Si₃N₄ is used at the entrance and exit faces, and a SiO₂ film controls the polarization and total internal reflection phase shifts at the side surfaces of the prism. The angular and wavelength sensitivity of these proposed Si-based polarization optical elements is also considered

Keywords

antireflection coatings; optical communication equipment; optical design techniques; optical films; optical polarisers; optical prisms; reflectivity; sensitivity; silicon compounds; μm communication wavelengths; μm lightwave communication wavelength; 1.3 mum; 1.55 mum; Si-based polarization optical elements; Si-related thin films; Si₃N₄; SiO₂; SiO₂ film; angular sensitivity; entrance faces; exit faces; in-line nondeviating linear polarizer; modular three-reflection prism; optical coatings; quarterwave retarder; side surfaces; silicon-based polarization optics; single-layer antireflection coating; total internal reflection phase shifts; wavelength sensitivity; Coatings; Optical collimators; Optical fiber polarization; Optical films; Optical polarization; Optical reflection; Optical refraction; Optical retarders; Optical sensors; Optical surface waves;

fLanguage

English

Journal_Title

Lightwave Technology, Journal of

Publisher

ieee

ISSN

0733-8724

Type

jour

DOI

10.1109/50.495170

Filename

495170