DocumentCode :
901494
Title :
Anomalous enhancement of substrate terminal current beyond pinch-off in silicon n-channel MOS transistors and its related phenomena
Author :
Nakahara, Mizuki ; Iwasawa, Hiroshi ; Yasutake, K.
Volume :
56
Issue :
11
fYear :
1968
Firstpage :
2088
Lastpage :
2090
Abstract :
Anomalous enhancement of substrate terminal current is observed in n-channel silicon MOS transistors beyond pinch-off, but not in p-channel devices. This phenomenon is interpreted as the hole current flow caused by the impact ionization of trapped electrons in Si-SiO2interface states and of valenced electrons at the pinched-off channel of the silicon surface.
Keywords :
Current measurement; Electron traps; Gain measurement; Heating; Impact ionization; MOSFETs; Silicon; Space vector pulse width modulation; Testing; Voltage;
fLanguage :
English
Journal_Title :
Proceedings of the IEEE
Publisher :
ieee
ISSN :
0018-9219
Type :
jour
DOI :
10.1109/PROC.1968.6810
Filename :
1448740
Link To Document :
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