Title :
Properties of Sr Ferrite Thin Films on Al-Si Underlayer
Author :
Kaewrawang, Arkom ; Ghasemi, Ali ; Liu, Xiaoxi ; Morisako, Akimitsu
Author_Institution :
Spin Device Technol. Center, Shinshu Univ., Nagano
fDate :
6/1/2009 12:00:00 AM
Abstract :
Strontium ferrite thin films have been deposited on silicon wafer with Al-Si underlayer by using a magnetron sputtering system. The obvious peak for strontium ferrite films deposited on Al-Si underlayer can be observed when substrate temperature is higher than 550degC. The saturation magnetization, coercivity, and remanent squareness ratio of strontium ferrite thin films increase with increasing substrate temperature. The maximum of coercivity and remanent squareness ratio in perpendicular direction are 6.4 kOe and 0.72, respectively, at substrate temperature of 600degC.
Keywords :
aluminium; coercive force; ferrites; magnetic thin films; silicon; sputter deposition; strontium compounds; surface morphology; Al-Si underlayer; Si; SrOFe2O3-Al-Si; coercivity; magnetron sputtering system; remanent squareness ratio; saturation magnetization; silicon wafer; strontium ferrite thin films; surface morphology; temperature 600 C; Al-Si; magnetron sputtering; perpendicular magnetic recording; strontium ferrite;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2009.2018900
