DocumentCode
907534
Title
Multistable states MIS transistor
Author
Chang, D.C.Y.
Author_Institution
Dept. of Electron. Eng., Feng Chia Univ., Taichung, Taiwan
Volume
137
Issue
1
fYear
1990
fDate
2/1/1990 12:00:00 AM
Firstpage
37
Lastpage
43
Abstract
Mathematical simulation and experimental studies of an MINpn (MISSS) metal-insulator-semiconductor bipolar transistor are described. Such devices generally have switching characteristics. The high-impedance state is associated with a reverse-biased p -n junction which sustains high voltages. The breakover occurs when the sum of the small-signal current gains reaches unity. The low-impedance state is associated with an accumulation at the semiconductor surface which increases the electric field across the insulator. The energy bandshift may cause the valence-band edge of the semiconductor to be at a higher energy level than the metal-work function. The metal-insulator-semiconductor (MIS) acts as a minority diode and has a large flow of valence electrons. The second regenerative feedback may create the intermediate stable state, if the positive resistance appears prior to the second breakover. The simulation results show that this intermediate stable state may happen when the oxide thickness is within a certain (tunnelling) range. The larger barrier height device (majority diode) has a greater possibility of exhibiting the intermediate stable state. The narrower basewidth device is more significant in indicating the voltage collapse. The experimental results confirmed the existence of the intermediate stable state
Keywords
bipolar transistors; metal-insulator-semiconductor devices; minority carriers; negative resistance; semiconductor device models; semiconductor switches; stability; switching; tunnelling; J/V characteristics; MIS transistor; barrier height; bipolar transistor; energy bandshift; energy level; high-impedance state; injected electrons accumulation; intermediate stable state; low-impedance state; majority diode; metal-insulator-mpn device; metal-insulator-semiconductor; metal-work function; minority diode; multistable states device; oxide thickness; regenerative feedback; reverse-biased p-n junction; second breakover; switching characteristics; tunnelling; valence electrons; valence-band edge; voltage collapse;
fLanguage
English
Journal_Title
Circuits, Devices and Systems, IEE Proceedings G
Publisher
iet
ISSN
0956-3768
Type
jour
Filename
217039
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