• DocumentCode
    909657
  • Title

    First-order parameter extraction on enhancement silicon MOS transistors

  • Author

    Hamer, M.F.

  • Author_Institution
    British Telecom, Research Laboratories, Ipswich, UK
  • Volume
    133
  • Issue
    2
  • fYear
    1986
  • fDate
    4/1/1986 12:00:00 AM
  • Firstpage
    49
  • Lastpage
    54
  • Abstract
    A novel transformation technique has been devised which enables the rapid evaluation of the key MOS transistor parameters, threshold voltage, gain and mobility degradation factor without recourse to the inaccurate compromise approaches previously used. In the paper, the previous methods are reviewed to highlight the errors which can occur, and then the new technique detailed. Extensions to the technique are discussed to enable three of the global parameters to be determined. Finally, a test block is described which is suitable for the parameter extraction routine developed.
  • Keywords
    insulated gate field effect transistors; semiconductor device models; MOST; gain; mobility degradation factor; modelling; parameter extraction routine; test block; threshold voltage; transformation technique;
  • fLanguage
    English
  • Journal_Title
    Solid-State and Electron Devices, IEE Proceedings I
  • Publisher
    iet
  • ISSN
    0143-7100
  • Type

    jour

  • DOI
    10.1049/ip-i-1.1986.0011
  • Filename
    4644090