DocumentCode
909657
Title
First-order parameter extraction on enhancement silicon MOS transistors
Author
Hamer, M.F.
Author_Institution
British Telecom, Research Laboratories, Ipswich, UK
Volume
133
Issue
2
fYear
1986
fDate
4/1/1986 12:00:00 AM
Firstpage
49
Lastpage
54
Abstract
A novel transformation technique has been devised which enables the rapid evaluation of the key MOS transistor parameters, threshold voltage, gain and mobility degradation factor without recourse to the inaccurate compromise approaches previously used. In the paper, the previous methods are reviewed to highlight the errors which can occur, and then the new technique detailed. Extensions to the technique are discussed to enable three of the global parameters to be determined. Finally, a test block is described which is suitable for the parameter extraction routine developed.
Keywords
insulated gate field effect transistors; semiconductor device models; MOST; gain; mobility degradation factor; modelling; parameter extraction routine; test block; threshold voltage; transformation technique;
fLanguage
English
Journal_Title
Solid-State and Electron Devices, IEE Proceedings I
Publisher
iet
ISSN
0143-7100
Type
jour
DOI
10.1049/ip-i-1.1986.0011
Filename
4644090
Link To Document