DocumentCode
911406
Title
Atomistic Full-Band Design Study of InAs Band-to-Band Tunneling Field-Effect Transistors
Author
Luisier, Mathieu ; Klimeck, Gerhard
Author_Institution
Network for Comput. Nanotechnol., Purdue Univ., WestLafayette, IN
Volume
30
Issue
6
fYear
2009
fDate
6/1/2009 12:00:00 AM
Firstpage
602
Lastpage
604
Abstract
Band-to-band tunneling field-effect transistors (BTBT FETs) are expected to exhibit a subthreshold swing (SS) better than the 60-mV/dec limit of conventional metal-oxide-semiconductor FETs at room temperature. Through atomistic modeling of a suite of realistically extended InAs p-i-n single-gate (SG) and dual-gate (DG) ultrathin-body (UTB) and gate-all-around nanowire (GAA NW) devices with a gate length of 20 nm, we demonstrate that such a reduced SS can only be achieved if the electrostatic potential under the gate contact is very well controlled. We find that GAA NWs keep an SS less than 60 mV/dec for diameters larger than 10 nm, while the bodies in DG and SG UTBs must be scaled down to 7 and 4 nm, respectively. Still, all the considered devices are characterized by an on current smaller than the ITRS requirements.
Keywords
III-V semiconductors; field effect transistors; nanowires; InAs; InAs band-to-band tunneling field-effect transistors; InAs p-i-n dual-gate ultrathin-body device; InAs p-i-n single-gate ultrathin-body device; atomistic full-band design; electrostatic potential; gate-all-around nanowire device; size 20 nm; Computational modeling; Computer networks; FETs; Nanoelectronics; Nanoscale devices; Nanotechnology; PIN photodiodes; Temperature; Tunneling; Voltage; Band-to-band tunneling (BTBT) transistors; full-band and atomistic quantum transport; subthreshold swing (SS); tight-binding;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2009.2020442
Filename
4968005
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