Title :
Statistical Simulation of the IC Manufacturing Process
Author :
Maly, Wojciech ; Strojwas, Andrzej J.
Author_Institution :
Department of Electrical Engineering, Carnegie-Mellon University, Pittsburgh, PA, USA
fDate :
7/1/1982 12:00:00 AM
Abstract :
Information about the random behavior of the IC manufacturing process can be applied for IC and process design tasks. In this paper a methodology for modeling random fluctuations of IC manufacturing process is proposed. A simulator of a complete bipolar manufacturing process called FABRICS, is described. A few applications illustrating advantages of the proposed statistical process modeling method are discussed.
Keywords :
Circuit simulation; Computational modeling; Fabrics; Fluctuations; Impurities; Integrated circuit modeling; Manufacturing processes; Monolithic integrated circuits; Process design; Random variables;
Journal_Title :
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
DOI :
10.1109/TCAD.1982.1270003
