• DocumentCode
    911996
  • Title

    Modeling the anomalous threshold voltage behavior of submicrometer MOSFET´s

  • Author

    Arora, Narain D. ; Sharma, Mahesh S.

  • Author_Institution
    Digital Equipment Corp., Hudson, MA, USA
  • Volume
    13
  • Issue
    2
  • fYear
    1992
  • Firstpage
    92
  • Lastpage
    94
  • Abstract
    A simple yet accurate semi-empirical analytical model for simulating the anomalous threshold voltage behavior in submicrometer MOSFETs is reported. The increase in the threshold voltage with decreasing channel length has been modeled by assuming a bias-independent, but channel-length-dependent, fixed charge at the source and drain ends. The new model requires two extra parameters in addition to the usual short-channel threshold voltage model parameters. These two parameters represent the magnitude of the fixed charge and the length over which the charge is spread at the source and drain ends. The model shows excellent agreement with the experimental threshold voltage data (within 2%) for submicrometer devices with varying oxide thickness, junction depth, and channel doping concentration.<>
  • Keywords
    insulated gate field effect transistors; semiconductor device models; analytical model; bias-independent; channel doping concentration; channel-length-dependent; fixed charge; junction depth; oxide thickness; submicrometer MOSFETs; submicron devices; threshold voltage behavior; Analytical models; Channel bank filters; Doping profiles; Equations; MOSFET circuits; Niobium; Semiconductor process modeling; Surface fitting; Testing; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.144969
  • Filename
    144969