DocumentCode
911996
Title
Modeling the anomalous threshold voltage behavior of submicrometer MOSFET´s
Author
Arora, Narain D. ; Sharma, Mahesh S.
Author_Institution
Digital Equipment Corp., Hudson, MA, USA
Volume
13
Issue
2
fYear
1992
Firstpage
92
Lastpage
94
Abstract
A simple yet accurate semi-empirical analytical model for simulating the anomalous threshold voltage behavior in submicrometer MOSFETs is reported. The increase in the threshold voltage with decreasing channel length has been modeled by assuming a bias-independent, but channel-length-dependent, fixed charge at the source and drain ends. The new model requires two extra parameters in addition to the usual short-channel threshold voltage model parameters. These two parameters represent the magnitude of the fixed charge and the length over which the charge is spread at the source and drain ends. The model shows excellent agreement with the experimental threshold voltage data (within 2%) for submicrometer devices with varying oxide thickness, junction depth, and channel doping concentration.<>
Keywords
insulated gate field effect transistors; semiconductor device models; analytical model; bias-independent; channel doping concentration; channel-length-dependent; fixed charge; junction depth; oxide thickness; submicrometer MOSFETs; submicron devices; threshold voltage behavior; Analytical models; Channel bank filters; Doping profiles; Equations; MOSFET circuits; Niobium; Semiconductor process modeling; Surface fitting; Testing; Threshold voltage;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/55.144969
Filename
144969
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