CAD for VLSI: Symple: a symbolic layout tool for bipolar and MOS VLSI

Author

Szabó, K. S B ; Leask, J.M. ; Elmasry, M.I.

Author_Institution

Bell Northern Research Ltd., Ottawa, Canada

Volume

135

Issue

2

fYear

1988

fDate

4/1/1988 12:00:00 AM

Firstpage

29

Lastpage

38

Abstract

Symbolic layout offers a powerful and flexible methodology for the design of bipolar and MOS cells. An integrated set of symbols that addresses both bipolar and MOS devices was previously reported. A design tool that implements the symbolic methodology based on that set has been developed; Symple is a processindependent layout editor that allows the designer to symbolically create cells in bipolar, NMOS, CMOS, mixed BIMOS, or a mixed BICMOS technology. While the program abstracts most of the process complexities from the designer, it also retains the relevant layout features. Mechanisms for compaction, mask generation and circuit extraction are included.

Keywords

VLSI; bipolar integrated circuits; circuit layout CAD; field effect integrated circuits; CMOs; NMOS ICs; Symple; bipolar ICs; circuit extraction; circuit layout CAD; compaction; integrated set of symbols; mask generation; mixed BICMOS; mixed BIMOS; process-independent layout editor; relevant layout features; symbolic layout tool; symbolic methodology; symbolically create cells;

fLanguage

English

Journal_Title

Solid-State and Electron Devices, IEE Proceedings I

Publisher

iet

ISSN

0143-7100

Type

jour

DOI

10.1049/ip-i-1.1988.0007

Filename

4644447