DocumentCode :
913375
Title :
On the gate current and noise behavior in pinched-off silicon junction field-effect transistors
Author :
Nakahara, Mizuki ; Kobayashi, Ichiro
Volume :
58
Issue :
7
fYear :
1970
fDate :
7/1/1970 12:00:00 AM
Firstpage :
1158
Lastpage :
1159
Abstract :
An exponential relation between the gate current of the silicon junction FET and the drain applied voltage is obtained experimentally. It is found that the noise enhancement and input impedance decrease of this device starts at a point corresponding to the appearance of the gate floating potential which is related to the gate current.
Keywords :
Current measurement; FETs; Germanium; Impact ionization; Impedance; JFETs; Noise figure; Semiconductor device noise; Silicon; Voltage;
fLanguage :
English
Journal_Title :
Proceedings of the IEEE
Publisher :
ieee
ISSN :
0018-9219
Type :
jour
DOI :
10.1109/PROC.1970.7878
Filename :
1449808
Link To Document :
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