• DocumentCode
    915922
  • Title

    InGaP/GaAs/InGaAs δ-doped p-channel field-effect transistor with p+/n+/p camel-like gate structure

  • Author

    Tsai, J.H. ; Lour, W.S. ; Liu, W.C.

  • Author_Institution
    Dept. of Electron. Eng., Nat. Kaohsiung Normal Univ., Kaohsiung
  • Volume
    45
  • Issue
    11
  • fYear
    2009
  • Firstpage
    572
  • Lastpage
    573
  • Abstract
    A new InGaP/GaAs/InGaAs camel-like gate field-effect transistor with a delta-doped p-channel is investigated. Owing to the p-n depletion of the camel-like gate structure, the considerable conduction band discontinuity at the p-GaAs/i-InGaAs heterojunction, and the confinement effect for holes in the InGaAs quantum well, simultaneously, a large gate turn-on voltage up to 2.3 V is obtained. Experimental results exhibit a maximum extrinsic transconductance of 34 mS/mm and a saturation current density of 233 mA/mm. An extremely broad gate voltage swing greater than 6 V with above 80 maximum transconductance is achieved. The f t and f max are of 3.2 and 6.7 GHz, respectively.
  • Keywords
    III-V semiconductors; current density; field effect transistors; gallium arsenide; gallium compounds; indium compounds; p-n heterojunctions; semiconductor quantum wells; wide band gap semiconductors; InGaP-GaAs-InGaAs; conduction band discontinuity; confinement effect; delta-doped p-channel field-effect transistor; extrinsic transconductance; gate turn-on voltage; gate voltage; p-GaAs-i-InGaAs heterojunction; p-n depletion; p+-n+-p camel-like gate structure; quantum well; saturation current density;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el.2009.0659
  • Filename
    4976888