DocumentCode
915922
Title
InGaP/GaAs/InGaAs δ-doped p-channel field-effect transistor with p+/n+/p camel-like gate structure
Author
Tsai, J.H. ; Lour, W.S. ; Liu, W.C.
Author_Institution
Dept. of Electron. Eng., Nat. Kaohsiung Normal Univ., Kaohsiung
Volume
45
Issue
11
fYear
2009
Firstpage
572
Lastpage
573
Abstract
A new InGaP/GaAs/InGaAs camel-like gate field-effect transistor with a delta-doped p-channel is investigated. Owing to the p-n depletion of the camel-like gate structure, the considerable conduction band discontinuity at the p-GaAs/i-InGaAs heterojunction, and the confinement effect for holes in the InGaAs quantum well, simultaneously, a large gate turn-on voltage up to 2.3 V is obtained. Experimental results exhibit a maximum extrinsic transconductance of 34 mS/mm and a saturation current density of 233 mA/mm. An extremely broad gate voltage swing greater than 6 V with above 80 maximum transconductance is achieved. The f t and f max are of 3.2 and 6.7 GHz, respectively.
Keywords
III-V semiconductors; current density; field effect transistors; gallium arsenide; gallium compounds; indium compounds; p-n heterojunctions; semiconductor quantum wells; wide band gap semiconductors; InGaP-GaAs-InGaAs; conduction band discontinuity; confinement effect; delta-doped p-channel field-effect transistor; extrinsic transconductance; gate turn-on voltage; gate voltage; p-GaAs-i-InGaAs heterojunction; p-n depletion; p+-n+-p camel-like gate structure; quantum well; saturation current density;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el.2009.0659
Filename
4976888
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