DocumentCode :
921767
Title :
Contactless characterization of semiconductor devices using surface photocharge effect
Author :
Das, P. ; Mihailov, V. ; Ivanov, O. ; Gueorgiev, V. ; Andreev, S. ; Pustovoit, V.I.
Author_Institution :
Dept. of Electr. Comput. & Syst. Eng., Rensselaer Polytech. Inst., Troy, NY, USA
Volume :
13
Issue :
5
fYear :
1992
fDate :
5/1/1992 12:00:00 AM
Firstpage :
291
Lastpage :
293
Abstract :
A technique for evaluating electrical properties of semiconductor wafers and devices using the surface photocharge effect caused by laser radiation is proposed. The measurement setup used in the experiments is presented along with some preliminary results. In particular, experimental results are presented for MOS devices on silicon under bias. It is possible to distinguish from the experimental plots the depletion, accumulation, and inversion regions of the device. Information could be obtained from these curves in a manner analogous to CV plots.<>
Keywords :
accumulation layers; inversion layers; laser beam applications; metal-insulator-semiconductor devices; photovoltaic effects; semiconductor device testing; semiconductor technology; surface potential; MOS devices; Si; accumulation region; contactless characterization; depletion region; electrical properties; inversion regions; laser radiation; semiconductor devices; semiconductor wafers; surface photocharge effect; Choppers; Contacts; Optical surface waves; Pulse amplifiers; Semiconductor devices; Semiconductor lasers; Silicon; Solids; Voltage; Wire;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.145057
Filename :
145057
Link To Document :
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