• DocumentCode
    922705
  • Title

    Geometric factor for Hall mobility characterization using the van der Pauw dual configuration

  • Author

    Nathan, Arokia ; Allegretto, Walter

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Waterloo Univ., Ont., Canada
  • Volume
    40
  • Issue
    8
  • fYear
    1993
  • fDate
    8/1/1993 12:00:00 AM
  • Firstpage
    1508
  • Lastpage
    1511
  • Abstract
    A geometric factor applicable to a wide range of device geometries of the van der Pauw dual configuration is presented. Such a configuration allows a direct retrieval of the Hall mobility in a single measurement of the magnetic-field-induced imbalance in output current. In view of scaling considerations, the geometric factor is characterized simply in terms of device aspect ratio (L/W) and relative electrode separation (d/W). The geometric factor, which is based on numerical computations, overcomes the limitations inherent in the existing form that has been analytically obtained for an infinitesimally small electrode separation. Hence, it is now possible to design practical device geometries which readily lend themselves to in situ measurement and characterization of the material or process in question, without being constrained by photolithography limitations
  • Keywords
    Hall effect; carrier mobility; semiconductor device models; Hall mobility characterization; device aspect ratio; device geometries; geometric factor; magnetic-field-induced imbalance; output current; photolithography limitations; relative electrode separation; van der Pauw dual configuration; Current measurement; Density estimation robust algorithm; Electrodes; Geometry; Hall effect; Lorentz covariance; Magnetic field measurement; Magnetic materials; Magnetic separation; Semiconductor materials;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.223712
  • Filename
    223712