DocumentCode
923741
Title
Model of a metal-oxide-silicon transistor operating in the saturation region
Author
Rossel, P. ; Martinot, H.
Author_Institution
CNRS, Laboratoire d´Automatique et d´Analyse des Systÿmes, Toulouse, France
Volume
9
Issue
18
fYear
1973
Firstpage
414
Lastpage
416
Abstract
The output resistance of an m.o.s. transistor operating in the saturation region is studied experimentally and theoretically. New experimental properties of the `resistance¿current¿ product are described. A model is proposed in which the structure is divided into two sections. In the source section, a gradual length approximation is assumed, taking into account the mobility¿field dependence; while in the drain section, the mobile-carrier charge is included in the `equivalent doping¿. The continuity conditions between the two regions are described. Good agreement is found between the theory and the experimental results.
Keywords
field effect transistors; resistance (electric); semiconductor device models; field effect transistors; metal insulator semiconductor devices; resistance; saturation region; semiconductor device models;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19730304
Filename
4236254
Link To Document