• DocumentCode
    925498
  • Title

    Ge-nanoclusters embedded in Ge-doped silica-on-silicon waveguides

  • Author

    Ou, H. ; Rordam, T.P. ; Rottwitt, K. ; Grumsen, F. ; Horsewell, A.

  • Author_Institution
    COM. DTU, Tech. Univ. of Denmark, Lyngby, Denmark
  • Volume
    42
  • Issue
    9
  • fYear
    2006
  • fDate
    4/27/2006 12:00:00 AM
  • Firstpage
    532
  • Lastpage
    534
  • Abstract
    Ge-nanoclusters were formed by electron-beam irradiation in Ge-doped silica-on-silicon thin films. The size and density of the clusters can be controlled by the irradiation intensity and time.
  • Keywords
    electron beam applications; germanium; integrated optics; nanostructured materials; optical glass; optical waveguides; thin films; SiO2-Si:Ge; electron-beam irradiation; germanium nanoclusters; silica-on-silicon thin films; silica-on-silicon waveguides;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20060399
  • Filename
    1628533
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=925498