DocumentCode
927014
Title
A processing quality prognostics scheme for plasma sputtering in TFT-LCD manufacturing
Author
Su, Yu-chuan ; Hung, Min-Hsiung ; Cheng, Fan-tien ; Chen, Yeh-Tung
Author_Institution
Inst. of Manuf. Eng., Nat. Cheng Kung Univ., Tainan, Taiwan
Volume
19
Issue
2
fYear
2006
fDate
5/1/2006 12:00:00 AM
Firstpage
183
Lastpage
194
Abstract
A novel quality prognostics scheme (QPS) for plasma sputtering in TFT-LCD manufacturing processes is proposed. The QPS consists of a conjecture model and a prediction model. The conjecture model can use processing parameters and sensor data to estimate the processing quality (sputtering thickness) in real time. This conjecture function is also called virtual metrology. On the other hand, the prediction model is capable of predicting the processing quality of the next-lot glasses. Neural networks and weighted moving average algorithms are applied to construct the QPS. In particular, a reliance index is developed such that online evaluation of whether the conjecture results of the QPS are trustworthy or not is possible. For increasing the accuracy of the QPS, a self-searching mechanism is designed to automatically search the best set of parameters and functions used by the conjecture and prediction algorithms for cases that the processing properties vary or the recipe changes. Also, an auto-adjusting mechanism is developed for tuning the system parameters of the QPS and bringing the conjecture accuracy within an acceptable bound. Thorough tests using normal and abnormal processing data on one set of plasma sputtering equipment in a TFT-LCD plant show that the values of the mean absolute percentage error of both the conjecture and the prediction results are less than 2%, which validates the effectiveness of the proposed QPS.
Keywords
liquid crystal displays; moving average processes; neural nets; plasma deposited coatings; process control; sputtered coatings; TFT-LCD manufacturing; auto-adjusting mechanism; conjecture model; neural networks; online evaluation; plasma sputtering; prediction model; processing quality prognostics; reliance index; self-searching mechanism; virtual metrology; weighted moving average algorithms; Algorithm design and analysis; Glass; Manufacturing processes; Mechanical factors; Metrology; Neural networks; Plasma materials processing; Prediction algorithms; Predictive models; Sputtering; Conjecture model; neural networks (NNs); prediction model; quality prognostics scheme (QPS); reliance index; virtual metrology;
fLanguage
English
Journal_Title
Semiconductor Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
0894-6507
Type
jour
DOI
10.1109/TSM.2006.873514
Filename
1628981
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