Title :
Field-emission triode of low-temperature synthesized ZnO nanowires
Author :
Lee, Chia Ying ; Li, Seu Yi ; Lin, Pang ; Tseng, Tseung-Yuen
Author_Institution :
Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
fDate :
5/1/2006 12:00:00 AM
Abstract :
A field-emission triode based on the low-temperature (75°C) and hydrothermally synthesized single-crystalline zinc-oxide nanowires (ZnO NWs) grown on Si substrate with a silicon dioxide (SiO2) insulator was fabricated for the controllable field-emission device application. Field-emission measurement reveals that the ZnO NWs fabricated on the Si substrate exhibit a good emission property with the turn-on electric field and threshold electric field (current density of 1 mA/cm2) of 1.6 and 2.1 V/μm, respectively, with a field enhancement factor β of 3340. The field-emission properties of the ZnO NW-based triode exhibit the controllable characteristics. The well-controlled field-emission characteristics can be divided into three parts: gate leakage region, linear region, and saturation region. Therefore, this study provides a low-temperature field-emission triode fabrication process that is compatible with the Si-based microelectronic integration, and the field-emission measurements also reveal that the emission behavior can be well controlled by adopting the triode structure.
Keywords :
II-VI semiconductors; current density; field emission; nanowires; triodes; wide band gap semiconductors; zinc compounds; Si; Si substrate; Si-based microelectronic integration; ZnO-Si-SiO2; current density; field enhancement factor; field-emission measurement; field-emission triode; gate leakage; low-temperature hydrothermally synthesized single-crystalline ZnO nanowires; silicon dioxide insulator; threshold electric field; Current density; Current measurement; Density measurement; Electric variables measurement; Fabrication; Gate leakage; Insulation; Nanowires; Silicon compounds; Zinc oxide; Field-emission triode and device; ZnO; hydrothermal method; nanowires (NWs);
Journal_Title :
Nanotechnology, IEEE Transactions on
DOI :
10.1109/TNANO.2006.874049