• DocumentCode
    935120
  • Title

    A semiconductor nonvolatile electron beam accessed mass memory

  • Author

    Hughes, William C. ; Lemmond, Charles Q. ; Parks, Harold G. ; Ellis, George W. ; Possin, George E. ; Wilson, Ronald H.

  • Author_Institution
    General Electric Company, Schenectady, N.Y.
  • Volume
    63
  • Issue
    8
  • fYear
    1975
  • Firstpage
    1230
  • Lastpage
    1240
  • Abstract
    BEAMOS-beam addressed metal-oxide-semiconductor is a new technology for fast auxiliary memories which is expected to find important applications in military and commercial data systems. The concept is based on electron beam accessing, using a matrix lens, of a simple MOS memory chip. It has performance features which include large bit capacity per module (> 30 × 106bits), short access time ( 10 Mbit/s), and low cost. The BEAMOS module is all electronic, rugged, and relatively insensitive to variations in temperature, making it especially attractive for military computer applications. The operating principles of the BEAMOS memory and its present state of development are described.
  • Keywords
    Charge carrier processes; Computer applications; Costs; Data systems; Electron beams; Military computing; Nonvolatile memory; Silicon compounds; Substrates; Temperature;
  • fLanguage
    English
  • Journal_Title
    Proceedings of the IEEE
  • Publisher
    ieee
  • ISSN
    0018-9219
  • Type

    jour

  • DOI
    10.1109/PROC.1975.9915
  • Filename
    1451845