DocumentCode
935120
Title
A semiconductor nonvolatile electron beam accessed mass memory
Author
Hughes, William C. ; Lemmond, Charles Q. ; Parks, Harold G. ; Ellis, George W. ; Possin, George E. ; Wilson, Ronald H.
Author_Institution
General Electric Company, Schenectady, N.Y.
Volume
63
Issue
8
fYear
1975
Firstpage
1230
Lastpage
1240
Abstract
BEAMOS-beam addressed metal-oxide-semiconductor is a new technology for fast auxiliary memories which is expected to find important applications in military and commercial data systems. The concept is based on electron beam accessing, using a matrix lens, of a simple MOS memory chip. It has performance features which include large bit capacity per module (> 30 × 106bits), short access time ( 10 Mbit/s), and low cost. The BEAMOS module is all electronic, rugged, and relatively insensitive to variations in temperature, making it especially attractive for military computer applications. The operating principles of the BEAMOS memory and its present state of development are described.
Keywords
Charge carrier processes; Computer applications; Costs; Data systems; Electron beams; Military computing; Nonvolatile memory; Silicon compounds; Substrates; Temperature;
fLanguage
English
Journal_Title
Proceedings of the IEEE
Publisher
ieee
ISSN
0018-9219
Type
jour
DOI
10.1109/PROC.1975.9915
Filename
1451845
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