Morphology of barrier layer formed on YBCO

Author

Matsui, T. ; Suzuki, T. ; Ishii, T. ; Tsuda, K. ; Nagano, M. ; Mukae, K.

Author_Institution

Fuji Electr. Corp. Res. & Dev. Ltd., Kanagawa, Japan

Volume

3

Issue

1

fYear

1993

fDate

3/1/1993 12:00:00 AM

Firstpage

1294

Lastpage

1297

Abstract

The morphology of barrier layers, such as LaSrGaO/sub 4/ (LSGO) and SrTiO/sub 3/ (STO), was investigated using an atomic force microscope (AFM) and tunnel junctions with an Au/barrier/YBCO layered structure. The barrier morphology depended strongly on both the surface roughness of YBCO films and the deposition temperature of the barrier materials. It was improved by reducing the surface roughness of the YBCO films and keeping the deposition temperature lower than 400 degrees C during the barrier formation. The experiments performed are described, and the results are presented and discussed.<>

Keywords

atomic force microscopy; barium compounds; high-temperature superconductors; lanthanum compounds; strontium compounds; superconducting thin films; surface topography; yttrium compounds; Au-LaSrGaO/sub 4/-YBaCuO; Au-SrTiO/sub 3/-YBaCuO; atomic force microscope; barrier layer; deposition temperature; high temperature superconductors; morphology; surface roughness; tunnel junctions; Atomic force microscopy; Atomic layer deposition; Electrodes; Gold; Rough surfaces; Substrates; Surface morphology; Surface roughness; Temperature; Yttrium barium copper oxide;

fLanguage

English

Journal_Title

Applied Superconductivity, IEEE Transactions on

Publisher

ieee

ISSN

1051-8223

Type

jour

DOI

10.1109/77.233386

Filename

233386