DocumentCode
940458
Title
Pulse shaping by laser-excited solid-state plasmas in silicon
Author
Platte, W.
Author_Institution
Universitÿt Erlangen-Nÿrnberg, Institut fÿr Hochfrequenztechnik, Erlangen, West Germany
Volume
12
Issue
23
fYear
1976
Firstpage
631
Lastpage
633
Abstract
A new method for d.c. or r.f. pulse shaping by laser-excited solid-state plasmas in a silicon microstrip device is described. An analysis is given to precalculate the output pulse shape for special parameter settings. Theoretical and experimental results were found to agree fairly well.
Keywords
laser beam applications; optoelectronic devices; photoconducting devices; pulse shaping circuits; semiconductor switches; solid-state microwave devices; solid-state plasma; strip line components; DC pulse shaping; RF pulse shaping; Si gap shunt microstrip structure; Si microstrip device; experimental results; high speed optoelectronic gating; laser excited solid state plasma in Si; microwave switch; optoelectronic pulse shaping; optoelectronic switch;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19760481
Filename
4240243
Link To Document