DocumentCode
945293
Title
Boron segregation data for d.m.o.s. devices
Author
Ladbrooke, P.H. ; Strudwick, M.N.
Author_Institution
University of New South Wales, Department of Solid-State Electronics, Kensington, Australia
Volume
14
Issue
5
fYear
1978
Firstpage
128
Lastpage
129
Abstract
A simple formula is given for the extent of boron depletion from the surface channel region of a d.m.o.s. f.e.t. during fabrication.
Keywords
doping profiles; insulated gate field effect transistors; semiconductor technology; B segregation data; DMOS FETs; surface channel region;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19780087
Filename
4240885
Link To Document