• DocumentCode
    947437
  • Title

    Improved structure for optimisation of focus and exposure for IC production

  • Author

    Walton, A.J. ; Fallon, M. ; Stevenson, J.T.M. ; Ross, A.W.S. ; Reeves, C.M.

  • Author_Institution
    Dept. of Electr. Eng., Edinburgh Univ., UK
  • Volume
    29
  • Issue
    17
  • fYear
    1993
  • Firstpage
    1573
  • Lastpage
    1574
  • Abstract
    A test structure that can be used for optimising the focus and exposure of wafer steppers is presented. It consists of a single layer of polysilicon which lends itself to automatic electrical measurement and does not suffer from the apex height reduction which occurs with the previously reported Gaudi structure.<>
  • Keywords
    focusing; integrated circuit manufacture; photolithography; IC production; automatic electrical measurement; exposure; focus; optimisation; wafer steppers;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19931048
  • Filename
    234333
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=947437