Title :
BESOI-based integrated optical silicon accelerometer
Author :
Plaza, Jose A. ; Llobera, Andreu ; Dominguez, Carlos ; Esteve, Jaume ; Salinas, Iñigo ; Garcia, Jorge ; Berganzo, J.
Author_Institution :
Centro Nacional de Microelectron., CSIC, Barcelona, Spain
fDate :
4/1/2004 12:00:00 AM
Abstract :
The design, simulation, fabrication and characterization of a new integrated optical accelerometer is presented in this paper. The reduction of fabrication, packaging and thermomechanical stresses are considered by keeping the weak mechanical parts free of stresses. The mechanical sensor consists on a quad beam structure with one single mass. In addition, there are two waveguides on the frame of the chip self-aligned to one on the mass of the accelerometer. Four lateral beams increase the mechanical sensitivity and allow the flat displacement of the optical waveguides on the mass. The working principle is based on the variation of the output light intensity versus the acceleration due to the misalignment of the waveguides. The devices have been optimized by the finite-element method to obtain a mechanical sensitivity of 1 μm/g. The fabrication technology is based on BESOI wafers combining bulk an surface micromachining. Moreover, machined glass wafers with cavities are bonded to the silicon wafer for packaging and damping control. Special packaging considerations as dicing, polishing and alignment are also presented. Optical measurements at 633 nm shown an optical sensitivity of 2.3 dB/g for negative and 1.7 dB/g for positive acceleration. This difference in the sensitivity has been demonstrated as a consequence of the passivation layer located over the core of the waveguides.
Keywords :
accelerometers; finite element analysis; integrated optics; micromachining; micromechanical devices; optical sensors; optical waveguides; BESOI wafers; BESOI-based integrated optical silicon accelerometer; damping control; devices optimization; fabrication technology; finite-element method; integrated optical accelerometer; lateral beams increase; machined glass wafers; mechanical parts stresses; mechanical sensitivity; mechanical sensor; optical waveguides; output light intensity variation; packaging considerations; packaging control; passivation layer; quad beam structure; silicon wafer; surface micromachining; thermomechanical stresses reduction; waveguides misalignment; Acceleration; Accelerometers; Integrated optics; Optical design; Optical device fabrication; Optical sensors; Optical waveguides; Packaging machines; Silicon; Thermal stresses;
Journal_Title :
Microelectromechanical Systems, Journal of
DOI :
10.1109/JMEMS.2004.824884