• DocumentCode
    951298
  • Title

    Comparison of Wafer Scale Integration with VLSI Packaging Approaches

  • Author

    Neugebauer, Constantine A. ; Carlson, Richard O.

  • Author_Institution
    General Electric Company,Schenectady,NY
  • Volume
    10
  • Issue
    2
  • fYear
    1987
  • fDate
    6/1/1987 12:00:00 AM
  • Firstpage
    184
  • Lastpage
    189
  • Abstract
    A comparison is made of various high-density packaging approaches, including printed wiring board, thick-film hybrids, and wafer scale integration (WSI). Criteria include power dissipation, density, delays, and cost. It is concluded that thin-film hybrids using state-of-the-art VLSI chips have the potential for WSI density and performance. The requirement for fault tolerance, additional levels of metallization, excess power dissipation, process conservatism to achieve finite yield, and the nonoptimum nature of the Al/Si02transmission line for cross wafer communication have made WSI noncompetitive.
  • Keywords
    Printed circuits; Thick-film circuit packaging; Thin-film circuit packaging; WSI; Wafer-scale integration (WSI); Costs; Delay; Fault tolerance; Metallization; Packaging; Power dissipation; Transistors; Very large scale integration; Wafer scale integration; Wiring;
  • fLanguage
    English
  • Journal_Title
    Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0148-6411
  • Type

    jour

  • DOI
    10.1109/TCHMT.1987.1134736
  • Filename
    1134736