DocumentCode :
951751
Title :
Electrical Characteristics of Copper/Polyimide Thin-Film Multilayer Interconnects
Author :
Lane, Thomas A. ; Belcourt, Frank J. ; Jensen, Ronald J.
Author_Institution :
Honeywell Physical Sciences Center,Bloomington
Volume :
10
Issue :
4
fYear :
1987
fDate :
12/1/1987 12:00:00 AM
Firstpage :
577
Lastpage :
585
Abstract :
A multilayer substrate Containing two-chip emitter-coupled logic (ECL) ring oscillator circuits was fabricated and tested to determine the static and dynamic electrical characteristics of the copper/polyimide thin-film multilayer (TFML) interconnections between chips. The circuit oscillated at 122 MHz without delay lines; delay lines in the circuit enabled measurement of 88 ps/cm propagation delay and -28 dB crosstalk between adjacent parallel lines. The measured electrical characteristics agreed with predictions obtained from static electrical models and SPICE simulations of the interconnections. The ring oscillator circuit has general applications for determining dynamic electrical characteristics of a variety of packaging structures, such as co-fired ceramic single-chip packages and tape-automated-bonding (TAB) leadframes.
Keywords :
Dielectric films; Integrated circuit interconnections; Interconnections, Integrated circuits; Circuit testing; Copper; Electric variables; Integrated circuit interconnections; Logic testing; Nonhomogeneous media; Polyimides; Ring oscillators; Thin film circuits; Transistors;
fLanguage :
English
Journal_Title :
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
Publisher :
ieee
ISSN :
0148-6411
Type :
jour
DOI :
10.1109/TCHMT.1987.1134780
Filename :
1134780
Link To Document :
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