• DocumentCode
    953969
  • Title

    Thin-Film Titanium Dioxide Capacitors for Microelectronic Applications

  • Author

    Keister, F.Z.

  • Author_Institution
    Hughes Aircraft Company
  • Volume
    12
  • Issue
    1
  • fYear
    1965
  • fDate
    3/1/1965 12:00:00 AM
  • Firstpage
    16
  • Lastpage
    20
  • Abstract
    This paper discusses investigations of vacuum-deposited thin-film titanium dioxide capacitors applicable to microelectronic circuits. Included are sections covering evaporant materials and their purities, vacuum evaporation techniques, anodizing procedures, substrate materials, and electrical properties of thin-film TiO2capacitors.
  • Keywords
    Dielectrics; Dioxide; Evaporation; Films; Mircoelectronic; Titanium; Vacuum; Capacitors; Dielectric constant; Dielectric materials; Dielectric substrates; Dielectric thin films; Microelectronics; Optical films; Thin film circuits; Titanium; Transistors;
  • fLanguage
    English
  • Journal_Title
    Component Parts, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0097-6601
  • Type

    jour

  • DOI
    10.1109/TCP.1965.1135086
  • Filename
    1135086
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=953969