• DocumentCode
    954408
  • Title

    Parallel Gap Welding to Thick-Film Metallization

  • Author

    Johnson, D.

  • Author_Institution
    Hybrid Microcircuit Technology,Albuquerque
  • Volume
    12
  • Issue
    3
  • fYear
    1976
  • fDate
    9/1/1976 12:00:00 AM
  • Firstpage
    187
  • Lastpage
    194
  • Abstract
    This study was directed at the parallel gap welding response of a series of gold and platinum-gold thick-film conductor materials which were subjected to various peak temperature/belt speed firing profiles. The parallel gap welding was conducted using a variety of weld voltage/pulse duration settings and a nominal 0.05-mm-thick by 0.38-mm-wide pure gold ribbon. Evaluation of the welds was determined through a 90° peel test. From the resulting data the following conclusions were reached. 1) Parallel gap welding is a viable approach to gold ribbon interconnection to thick film. 2) In general, thicker fired films respond better to parallel gap welding. 3) Sensitivity to firing profile, as reflected by parallel gap weld strength, is a characteristic of each specific thick-film material which must be determined and properly optimized. 4) Sensitivity to weld parameters is a characteristic of each specific material and should be optimized with firing profile. 5) The Pure gold conductor materials are not as satisfactory as platinum-gold conductors for parallel gap welding.
  • Keywords
    Gold; Gold alloys/compounds; Integrated circuit metallization; Platinum alloys/compounds; Thick-film circuits; Welding; Belts; Conducting materials; Conductive films; Firing; Gold; Metallization; Temperature; Testing; Voltage; Welding;
  • fLanguage
    English
  • Journal_Title
    Parts, Hybrids, and Packaging, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0361-1000
  • Type

    jour

  • DOI
    10.1109/TPHP.1976.1135127
  • Filename
    1135127