DocumentCode :
958156
Title :
Microwave characterization of the contiguous domain oscillator
Author :
Yin, Yingjie ; Balzan, M.L. ; Geissberger, A.E.
Volume :
36
Issue :
11
fYear :
1989
fDate :
11/1/1989 12:00:00 AM
Firstpage :
2611
Abstract :
Summary form only given. The authors report the first observation of microwave oscillation in the contiguous domain oscillator (CDO). Computer simulations indicate that, if the channel field VGG/L is in the regime of negative differential mobility for electrons in GaAs, a contiguous sequence of charge domains will form spontaneously along the entire length of the channel, continuously drifting into the drain. Experimental devices were fabricated using a standard ion-implanted MESFET process, modified to include a WSiN resistive gate. The gate resistivity is 30 k Omega /sq, channel doping is 1.2*1017 cm-3, and channel thickness is 150 nm. Channel widths range from 200 to 400 mu m and lengths from 10 to 50 mu m. Devices were mounted in a waveguide insertion unit, and operation was characterized between 26 and 140 GHz using a Tektronix 2755P spectrum analyzer. Modulation of the oscillation frequency by the gate-to-source VG1-s was observed, as predicted by the computer simulation.
Keywords :
Gunn oscillators; III-V semiconductors; gallium arsenide; solid-state microwave devices; 10 to 50 micron; 200 to 400 micron; 26 to 140 GHz; 2D electrostatic geometry; EHF; GaAs; Gunn devices; III-V semiconductors; MESFET; MM-wave device; MODFET; SHF; WSiN resistive gate; channel lengths; channel widths; charge domains; contiguous domain oscillator; microwave characterisation; microwave oscillation; millimetre wave frequencies; negative differential mobility; transferred electron effect; waveguide insertion unit; Aircraft; Capacitance; Computer simulation; Conductivity; Doping; Electron mobility; Frequency; Frequency conversion; Gallium arsenide; MESFETs; Microwave oscillators; Millimeter wave technology; Schottky diodes; Semiconductor diodes; Solid state circuits; Spectral analysis; Wafer scale integration;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.43695
Filename :
43695
Link To Document :
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